faculty

Christos G. Takoudis

(Ph.D., University of Minnesota, 1982)

Phone: (312) 355-0859 
E-Mail: Takoudis@uic.edu
More Info:  www.uic.edu/labs/AMReL

Micro- and nano-electronic materials and processing. One thrust is relationships among processing, properties and structure of micro- and nano-materials as well as the development of new materials systems and processes. Objectives include novel substrate surface cleaning techniques, prediction of processing-properties relationships, kinetics and surface chemistry of reaction processes on substrate surfaces of interest, controlled production of ultra-thin heterostructure layers, and design of new material systems for fabrication of optical, electronic and electro-mechanical systems at the micro- and nanometer length scale. In situ probing of surface and gas phase chemical phenomena during the thin film growth of micro- and nano-electronic materials is at the center of our studies too.

Selective Atomic Layer Deposition. Selective atomic layer deposition (SALD) is a process of depositing thin film materials selectively on one surface than on another. It is typically performed by using self-assembled-monolayers (SAMs). SAMs block active nucleation sites on substrate surface and inhibit ALD growth. However, long assembly time and additional processing steps are involved in this. We developed a novel, inherently selective deposition process for selective ALD of metals, metal oxides and semiconductors. The process is unique in that it doesn’t require the use of SAMs, lithography or other ex-situ processing steps. We make use of theoretical and experimental tools (e.g., nucleation delay of different precursors and oxygen sources on different surfaces) to achieve selective deposition.  

ALD of Biomaterials in Nanomedicine . Atomic layer deposition (ALD) of biocompatible material systems and/or nanofilms on biomedical implants appear to be promising for prolonging the life of biomedical implants. In collaboration with orthopedic and dental surgeons as well as other colleagues we have been working on material systems and processes that can result in enhanced tribo-corrosion resistance, improved osseointegration and hitherto unavailable approaches to the nanomedicine of biomedical implants.

Long-term inhibition of bacterial infections in implant devices . Implant-associated infections are potentially serious complications of medical device insertions. Many times, such infections are difficult to treat. Implant-associated infections may arise in the weeks following surgery due to contamination. At later times, infections can arise from hematogenous sources. In joint replacements, treatment entails aggressive systemic and local antibiotic treatment, debridement, and many times implant removal and reimplantation. Despite aggressive antibiotic treatments, eradication of established implant-associated infections is often unsuccessful. In collaboration with clinical and other colleagues, our research and implementation of implant surfaces modified with doped materials and/or antibiotics are intended to have a significant knowledge-driven anti-bacterial effect in surgical implants.

Selected Recent Publications

--- 2015 ---

Sathees Kannan Selvaraj and Christos G Takoudis, "Scalable control program for multi-precursor flow-type atomic layer deposition system", J. Vac. Sci. Technol. A 33, 013201 (2015)

Sweetu Patel, Giovanni Francesco Solitro, Cortino Sukotjo, Christos Takoudis, Mathew T. Mathew, Farid Amirouche, Tolou Shokuhfar , “Nano-Topography and Surface Stress Analysis of Ti6Al4V Bio-Implant: An alternative Design for Stability,” Journal of Minerals, Metals and Materials Society, in press (2015)

Azimi, Nasim; Xue, Zheng; Bloom, Ira; Gordin, Mikhail; Wang, Donghai; Daniel, Tad; Takoudis, Christos; Zhang, Zhengcheng, “Understanding the Effect of Fluorinated Ether on the Improved Performance of Lithium-Sulfur Batteries,” ACS Applied Materials & Interfaces 7, 9169-9177 (2015)

Hamlekhan, Azhang; Sinha-Ray, Suman; Takoudis, Christos; Mathew, Mathew; Sukotjo, Cortino; Yarin, Alexander; Shokuhfar, Tolou, “Fabrication of Drug Eluting Implants: Study of Drug Release Mechanism from Titanium Dioxide Nanotubes,” Journal of Physics D: Applied Physics 48, 1-11 (2015)

Xiaodan Cui, Alan D. Zdunek, Gregory Jursich, and Christos G. Takoudis, “Nanostructured Ni-YSZ by Atomic Layer Deposition,” ECS Journal of Solid State Science and Technology, 4 (12) P1-P7 (2015)

John Grotberg, Azhang Hamlekhan, Arman Butt, Sweetu Patel, Dmitry Royhman, Tolou Shokuhfar, Cortino Sukotjo, Christos Takoudis, Mathew T. Mathew, “Thermally oxidized titania nanotubes enhance the corrosion resistance of Ti6Al4V,” Materials Science and Engineering C, in press (2015)

Nasim Azimi, Zheng Xue, Nancy Dietz Rago, Christos Takoudis , Mikhail L. Gordin, Jiangxuan Song, Donghai Wang, Zhengcheng Zhang, “Fluorinated Electrolytes for Li-S Battery: Suppressing the Self-discharge with an Electrolyte Containing Fluoroether Solvent” Journal of The Electrochemical Society 162, A64-A68 (2015)

Nasim Azimi , Zheng Xue , Libo Hu , Christos Takoudis, Shengshui Zhang , and Zhengcheng Zhang,“Additive Effect on the Electrochemical Performance of Lithium-Sulfur Battery” Electrochimica Acta 154, 205-210 (2015)

--- 2014 ---

A. Hamlekhan, C. Takoudis, C. Sukotjo, M.T. Mathew, A. Virdi, R. Shahbazian-Yassar, T. Shokuhfar, Recent Progress Toward Surface Modification of Bone/Dental Implants with Titanium and Zirconia Dioxide Nanotubes, Journal of Nanotechnology and Smart Materials 1, 301 (2014)

Arman Butt, Newton B. Lucchiari Jr., Dmitry Royhman, Maria J. Runa, Mathew T. Mathew, Cortino Sukotjo, Christos G. Takoudis, “Design, Development and Testing of a Compact Tribocorrosion Apparatus for Biomedical Applications,” Journal of Bio- and Tribo-Corrosion, 1:4, 1 (2014)

Y. Yang, Q. Tao, G. Srinivasan, C. G. Takoudis "Cyclic Chemical Vapor Deposition of Nickel Ferrite Thin Films using Novel Organometallic Precursor Combination", ECS Journal of Solid State Science and Technology 3, P345-352 (2014)

Peter K. Rossman, Anirudh Dube, Tolou Shokufar, Christos Takoudis, Cortino Sukotjo, Mathew T. Mathew, "Tribocorrosion Apparatus for Biomedical Applications: Construction and Initial Outcomes, Innovations in Corrosion and Materials Science 4, 21-28 (2014).

Sweetu B. Patel, Azhang Hamlekhan, Dmitry Royhman, Arman Butt, Judy Yuan, Tolou Shokuhfar, Cortino Sukotjo, Mathew T. Mathew, Gregory Jursich, Christos G. Takoudis, "Enhancing Surface Characteristics of Ti-6Al-4V for Bio-implants Using Integrated Anodization and Thermal Oxidation," Journal of Materials Chemistry B, 2(23) 3597-3608 (2014).

Azhang Hamlekhan, Arman Butt, Sweetu Patel, Dmitry Royhman, Christos Takoudis, Cortino Sukotjo, Judy Yuan, Gregory Jursich, Mathew T. Mathew, William Hendrickson, Tolou Shokuhfar, "Anti- Aging TiO2 nanotubes for Biomedical Applications," PLoS One 9, e96213/1 – e96213/10 (2014).

Sathees Kannan Selvaraj, Alan Feinerman and Christos G Takoudis, "Growth behavior and properties of atomic layer deposited tin oxide on silicon from novel tin(II)acetylacetonate precursor and ozone", Journal of Vacuum Science and Technology A 32, 01A112 (2014)

Dmitry Royhman, Xochitl Dominguez-Benetton, Judy Chia-Chun Yuan, Tolou Shokuhfar, Christos Takoudis, Mathew T Mathew, and Cortino Sukotjo, "The Role of Nicotine on the Corrosive Behavior of a Ti-6Al-4V Dental Implant", Clinical Implant Dentistry and Related Research, in press (2014)

Arman Butt, Sweetu B. Patel, Azhang Hamlekhan, Dmitry Royhman, Tolou Shokuhfar, Cortino Sukotjo, Mathew T. Mathew and Christos G. Takoudis, "A Novel Investigation of the Formation of TiO2 Nanotubes on Thermally Formed Oxide of Ti-6Al-4V," Journal of Oral Implantology, in press (2014)

Sathees Kannan Selvaraj, Albert Colon, Jorge Ivan Rossero, Junxia Shi, and Christos G. Takoudis, "Effect of Using Ethanol as the Oxygen Source on the Growth and Dielectric Behavior of Atomic Layer Deposited Hafnium Oxide," ECS Transactions 61 (6), 93-102 (2014)

Sweetu Patel, Arman Butt, Qian Tao, Jorge Ivan Rossero, Dmitry Royhman, Cortino Sukotjo and Christos Takoudis, "Novel Functionalization of Ti-V Alloy and Ti-II using Atomic Layer Deposition for Improved Surface Wettability," Colloids and Surfaces B: Biointerfaces Journal, Volume 115, 1 March 2014, Pages 280-285 (2014)

Sathees Kannan Selvaraj, Jaya Parulekar and Christos G Takoudis, "Selective atomic layer deposition of zirconia on copper patterned silicon substrates using ethanol as oxygen source as well as copper reductant", Journal of Vacuum Science and Technology A, 32, 010601 (2014).

--- 2013 ---

Azimi Nasim, Wei Weng, Christos Takoudis, Zhengcheng Zhang, “Improved Performance of Lithium-Sulfur Battery with Fluorinated Electrolyte," Electrochemistry Communications, in press (2013).

Runshen Xu, Sathees Kannan Selvaraj, Gregory Jursich, Alan Feinerman and Christos Takoudis, "Nucleation Behavior-Morphology-Resistivity of Atomic Layer Deposited Pt on Atomic Layer Deposited Yttria-Stabilized Zirconia Films”, Journal of Solid State Science and Technology, 2 (11), P452 (2013)

Sathees Kannan Selvaraj, Gregory Jursich and Christos G Takoudis “Design and implementation of a novel portable atomic layer deposition / chemical vapor deposition hybrid reactor,” Review of Scientific Instruments, 84, 095109 (2013)

Royhman D, Yuan J.C., Shokuhfar T., Takoudis C.G., Sukotjo C. and M.T. Mathew “Tribocorrosive behaviour of commonly used TMJ implants in a synovial fluid-like environment: Ti-6Al-4V and CoCrMo,” J. Phys. D: Appl. Phys., 46 404002 (2013)

--- 2012 ---

Rasul, Amjad; Zhang, Jie; Gamota, Dan; Takoudis, Christos, “ High K nanocomposite dielectric for printed organic electronics applications,” Microelectronic Engineering 93 , 95-99 (2012).

Xu, Runshen; Takoudis, Christos G.,” Chemical passivation of GaSb-based surfaces by atomic layer deposited ZnS using diethylzinc and hydrogen sulfide,” Journal of Vacuum Science & Technology, A: Vacuum, Surfaces, and Films 30, 01A145/1-01A145/8 (2012).

Qian Tao, Kirsten Overhage, Gregory Jursich, Christos Takoudis, “On the Initial Growth of Atomic Layer Deposited TiO2 Films on Silicon and Copper Surfaces,” Thin Solid Films 520, 6752-6756 (2012).

Runshen Xu, Qian Tao, Yi Yang, Christos G. Takoudis, “Atomic Layer Deposition and Characterization of Stoichiometric Erbium Oxide Thin Dielectrics on Si(100) using (CpMe)3Er Precursor and Ozone,” Applied Surface Science 258, 8514-8520 (2012).

Runshen Xu, Christos G. Takoudis, “Atomic Layer Deposition and Characterization of Amorphous ErxTi1-xOy Dielectric Thin Films,” ECS J. Solid State Sci. Technol.1, N107-N114 (2012).

Runshen Xu, Sathees Selvaraj, Nasim Azimi, Christos G. Takoudis, “Growth characteristics and properties of yttrium oxide films by ALD from novel Y(iPrCp)3 precursor and O3,” ECS Transactions, in press (2012).

--- 2011 ---

Tao Q., A. Kueltzo, M. Singh, G. Jursich, C.G. Takoudis, “Atomic Layer Deposition of HfO2, TiO2, and HfxTi1-xO2 Using Metal (Diethylamino) Precursors and H2O; J. Electrochem. Soc. 158, G27-G33 (2011).

Tao Q., G. Jursich, C.G. Takoudis, “Investigation of Surface Sputtering and Post Annealing Effects on Atomic Layer Deposited HfO2 and TiO2,” IEEE Transactions on Semiconductor Manufacturing 24, 17-22 (2011) (invited)

Banerjee K., J. Huang, S. Ghosh, R. Xu, C. G. Takoudis, E. Plis, S. Krishna, S. Ketharanathan, M. Chriss, "Surface study of thioacetamide and zinc sulfide passivated long wavelength infrared type-II strained layer superlattice," SPIE 8012, 801243/1-801243/8 (2011).

Xu R., J. Huang, S. Ghosh, C. G. Takoudis, “Deposition and Characterization of Atomic Layer Deposited ZnS Thin Films on p-type GaSb(100) Using Diethylzinc Precursor and Hydrogen Sulfide,” ECS Transactions 41, 229-236 (2011).

--- 2010 ---

Singh M., Y. Yang, C.G. Takoudis, A. Tatarenko, G. Srinivasan, P. Kharel, G. Lawes, “Multiferroic BiFeO3 Thin Films for Multifunctional Devices,” J. Nanoscience and Nanotechnology 10, 6195-6199 (2010).

Rasul A., J. Zhang, D. Gamota, C.G. Takoudis, “Flexible high capacitance nanocomposite gate insulator for printed organic field effect transistors,” Thin Solid Films 518, 7024-7028 (2010).

Jiang L., J. Zhang, D. Gamota, C.G. Takoudis, “Organic thin film transistors with novel thermally cross-linked dielectric and printed electrodes on flexible substrates,” Organic Electronics 11, 959-963 (2010).

Jiang L., J. Zhang, D. Gamota, C.G. Takoudis, “Enhancement of the field-effect mobility of solution processed organic thin film transistors by surface modification of the dielectric,” Organic Electronics 11, 344-350 (2010).

Qian Tao; Gregory Jursich; Takoudis Christos G; Structure&Dielectric Characterizations of Atomic Layer Deposited HfO2 and TiO2 as promising Gate Oxides;IEEE/ASMC conference proceeding (2010), 1.4

Qian Tao; Gregory Jursich; Takoudis Christos G; Selective atomic layer deposition of HfO2 on copper patterned silicon substrates;Applied Physics Letters (2010), 96(192105).

--- 2009 ---

Majumder P., G. Jursich, C. Takoudis, "Structural phase transformation of Y2O3 doped HfO2 films grown on Si using atomic layer deposition," J. Appl. Phys., in press (2009)

Qian Tao; Gregory Jursich; Prodyut Majumber; Manish Singh; Weronika Walkosz; Peter Gu; Robert Kelie; Takoudis Christos G; Composition-Structure-Dielectric Properties of Yttrium Doped Hafnium Oxide Films by Atomic Layer Deposition; Electrochemical Solid-state letters (2009), 12(9), G50-G53.

Seo P.-S, J.-J. Jeong, L. Zeng, C.G. Takoudis, B.J. Quinn, A.A. Khan, T. Hanada, A.H. Chishti, "Alternatively spliced exon 5 of the FERM domain of Protein 4.1R encodes a novel ninding site for erythrocyte p55 and is critical for membrane targeting in epithelial cells," Biochimica et Biophysica Acta - Molecular Cell Research 1793, 281-289 (2009)

Chian W.W., C.G. Takoudis, S.H. Lee, A. Weis-McNulty, R. Glick, N. Alperin, "Relationship between Ventricular Morphology and Aqueductal Cerebrospinal Fluid Flow in Healthy and Communicating Hydrocephalus," Investigative Radiology 44, 192-199 (2009)

Seo P.-S, B. J. Quinn, A.A. Khan, L. Zeng, C.G. Takoudis, T. Hanada, A. Bolis, A. Bolino, A.H. Chishti, "Identification of erythrocyte p55/MPP1 as a binding partner of NF2 tumor suppressor protein/Merlin," Experimental Biology and Medicine 234, 255-262 (2009)

Singh M., Y. Yang, C.G. Takoudis, A. Tatarenko, G. Srinivasan, P. Kharel, G. Lawes, "Metalorganic Chemical Vapor Deposited BiFeO3 films for tunable high-frequency devices," Electrochemical and Solid-State Letters 12, H161-H164 (2009).

Singh M., Y. Yang, C.G. Takoudis, A. Tatarenko, G. Srinivasan, P. Kharel, G. Lawes, "Multiferroic BiFeO3 Thin Films for Multifunctional Devices," J. Nanosci. Nanotechnol., in press (2009)

--- 2008 ---

Katamreddy R., V. Omarjee, B. Feist, C. Dussarrat, M. Singh, C. Takoudis, "Tuning of material and electrical properties of strontium titanates using process chemistry and composition," ECS Transactions 16, 487-496 (2008).

Song X., D. Gopireddy, C.G. Takoudis, "Characterization of titanium oxynitride films deposited by low pressure chemical vapor deposition using amide Ti precursor," Thin Solid Films 516, 6330-6335 (2008).

Piret F., Singh M., Takoudis C. G., Su B.-L., "Optical properties in the UV range of a Ta2O5 inverse opal photonic crystal designed by MOCVD," Chemical Physics Letters 453, 87-91 (2008).

Rasul A., J. Zhang, D. Gamota, C.G. Takoudis, "Flexible high capacitance nanocomposite gate insulator for printed organic field effect transistors," Thin Solid Films in press (2008).

Majumder P., C.G. Takoudis, "Thermal stability of Ti/Mo and Ti/MoN nanostructures for barrier applications in Cu interconnects," Nanotechnology 19, 205202/1-205202/5 (2008).

Majumder P., G. Jursich, A. Kueltzo, C.G. Takoudis, "Atomic Layer Deposition of Y2O3 Films on Silicon Using Tris (Ethylcyclopentadienyl) Yttrium Precursor and Water Vapor," Journal of the Electrochemical Society 155, G152-G158 (2008).

Gopireddy D., C.G. Takoudis, "Diffusion-reaction modeling of the silicon oxide interlayer growth during thermal annealing of high dielectric constant materials on silicon," Physical Review B 77, 205304/1-205304/9 (2008).

Katamreddy R., R. Inman, G. Jursich, A. Soulet, C.G. Takoudis, "Nitridation and oxynitridation of Si to control interfacial reaction with HfO2," Thin Solid Films, in press (2008).

Singh M., Y. Yang, C.G. Takoudis, "Low-pressure metalorganic chemical vapor deposition of Fe2O3 thin films on Si(100) using n-butylferrocene and oxygen," Journal of the Electrochemical Society, in press (2008)

Katamreddy R., B. Feist, C.G. Takoudis, "Bis(diethylamino) silane as the silicon precursor in the atomic layer deposition of HfSiOx," Journal of the Electrochemical Society 155, G163-G167 (2008)

Majumder P., C.G. Takoudis, "Reactively Sputtered Mo-V nitride Thin Films as Ternary Diffusion Barriers for Copper Metallization," Journal of the Electrochemical Society, in press (2008)

Katamreddy R., R. Inman, G. Jursich, A. Soulet, C.G. Takoudis, "Effect of film composition and structure on the crystallization point of atomic layer deposited HfAlOx using metal (diethylamino) precursors and ozone," Acta Materialia 56, 710-718 (2008)

--- 2007 ---

Katamreddy R., R. Inman, G. Jursich, A. Soulet, A. Nicholls, C.G. Takoudis, "Post deposition annealing of aluminum oxide deposited by atomic layer deposition using novel tris(diethylamino)aluminum and water vapor on Si(100)," Thin Solid Films 515, 6931-6937 (2007).

Song X., C.G. Takoudis, "Effect of NH3 on the low pressure chemical vapor deposition of TiO2 film at low temperature using tetrakis(diethylamino)titanium and oxygen," J. Vac. Sci. Techn. A 25, 360-367 (2007)

Katamreddy R., R. Inman, G. Jursich, A. Soulet, C.G. Takoudis, "ALD and characterization of aluminum oxide deposited on Si(100) using tris(diethylamino) aluminum and water vapor," Journal of the Electrochemical Society 154, S5 (2007).

Song X., C.G. Takoudis, "Cyclic chemical vapor deposited TiO2/Al2O3 films using trimethyl aluminum, tetrakis(diethylamino)titanium and O2," Journal of the Electrochemical Society G177-182, 154 (2007)

Singh M.K., Rosado J., Katamreddy R., Deshpande A., C.G. Takoudis, "Investigation of Local Coordination and Electronic Structure of Dielectric Thin Films from Theoretical Energy-loss Spectra, in Characterization of Oxide/Semiconductor Interfaces for CMOS Technologies," MRS Symposium Series 996E, 33-38 (2007).

Singh M.K., Katamreddy R., C.G. Takoudis, "Effect of Oxidizer on Chemical Vapor Deposited Hafnium oxide-based Nanostructures and the Engineering of their Interfaces with Si(100), in Characterization of Oxide/Semiconductor Interfaces for CMOS Technologies," MRS Symposium Series 996E, 69-74 (2007).

Majumder P., Katamreddy R., C.G. Takoudis "Characterization of Atomic Layer Deposited Ultrathin HfO2 Film as a Diffusion Barrier in Cu Metallization,” in Materials, Processes, Integration and Reliability in Advanced Interconnects for Micro- and Nanoelectronics," MRS Symposium Series 990, 97-102 (2007).

Majumder P., Katamreddy R., C.G. Takoudis, "Atomic Layer Deposited Ultrathin HfO2 and Al2O3 Films as Diffusion Barriers in Copper Interconnects," Electrochemical and Solid-State Letters 10, H291-H295 (2007).

Majumder P., Katamreddy R., C.G. Takoudis, "Effect of film thickness on the breakdown temperature of atomic layer deposited ultrathin HfO2 and Al2O3 diffusion barriers in copper metallization," Journal of Crystal Growth 309, 12-17 (2007).

Katamreddy R., R. Inman, G. Jursich, A. Soulet, C.G. Takoudis, "Atomic layer deposition of HfO2, Al2O3 and HfAlOx using O3 and metal(diethylamino) precursors," Journal of Materials Research 22, 3455-3464 (2007)

Majumder P., M. Tiwari, C. Megaridis, M. Xu, J.McAndrew, C.G. Takoudis, "Evaluation and Testing of Organometallic Precursor for Copper Direct-Write," MRS Symposium Series 1002E, 23-29 (2007)

Majumder P., C.G. Takoudis, "Investigation on the diffusion barrier properties of sputtered Mo/W-N thin films in Cu interconnects," Applied Physics Letters 91, 162108/1-162108/3 (2007)

--- 2006 ---

Deshpande A., R. Inman, G. Jursich, C.G. Takoudis, "Characterization of hafnium oxide grown on silicon by atomic layer deposition: Interface structure," Microelectronic engineering 83, 547-552 (2006).

Deshpande A., R. Inman, G. Jursich, C.G. Takoudis, "Annealing Behavior of Atomic Layer Deposited Hafnium Oxide on Silicon: Changes at the Interface," J. Appl. Phys. 99, 094102/1-094102/7 (2006).

Katamreddy R., R. Inman, G. Jursich, A. Soulet, C.G. Takoudis, "Atomic Layer Deposition and Characterization of Aluminum Oxide Deposited on Si(100) using tris(diethylamino) Aluminum and Water Vapor," J. Electrochem. Soc. 153, C701-706 (2006).

Katamreddy R., R. Inman, G. Jursich, A. Soulet, C.G. Takoudis, "Controlling interfacial reactions between HfO2 and Si using ultrathin Al2O3 diffusion barrier layer," Applied Physics Letters 89, 262906/1-262906/3 (2006).

--- 2005 ---

Dasgupta A., D.-U. Jin, C.G. Takoudis, "Film strain and compositional changes in thermally nitrided silicon dioxide thin films," Thin Solid Films 472, 270-4 (2005).

Dasgupta A., C.G. Takoudis, Y. Lei, N.D. Browning, "Si0.85Ge0.15 oxynitridation in wet-nitric oxide ambient," Microelectronic Engineering 77, 242-249 (2005).

Murali S., A. Deshpande, C.G. Takoudis, "Modeling of the Metalorganic Chemical Vapor Deposition of Tantalum Oxide from Tantalum Ethoxide and Oxygen," Ind. Eng. Chem. Res. 44, 6387-6392 (2005).

--- 2004 ---

Roy Chowdhuri A. and C.G. Takoudis, Investigation of the aluminum oxide/Si(100) interface formed by chemical vapor deposition," Thin Solid Films 446, 155-159 (2004).

Do.-U. Jin, C. G. Takoudis, J. Zhang, P. W. Brazis, and D. Gamota, "Novel Roll-to-Roll Metal Patterning on Flexible Substrates for Thin Organic Field Effect Transistor Technology," MRS Symposium Series EXS-2(Nontraditional Approaches to Patterning) , 51-53 (2004).

Deshpande A., R. Inman, G. Jursich, C.G. Takoudis, "Atomic Layer Deposition and Characterization of Hafnium Oxide Grown on Silicon from tetrakis(diethylamino)Hafnium and Water Vapor," J. Vac. Sci. Technol. A 22, 2035-2040 (2004).

Cui Z., J.M. Madsen, C.G. Takoudis, "A Thermal Processing System for Microelectronic Materials," Measurement Science and Technology 15, 2099-2107 (2004).

Roy Chowdhuri A. and C.G. Takoudis, Quantitative estimation of strain and substoichiometry near the SiO2/Si(100) interface," Thin Solid Films 457, 402-405 (2004).

--- 2003 ---

Dasgupta A., C.G. Takoudis, Y. Lei, and N.D. Browning, "Si0.85Ge0.15 oxynitridation in nitric oxide/nitrous oxide ambient," J. Applied Physics 94, 716-719 (2003).

Dasgupta A. and C. G. Takoudis, "Low temperature Si0.85Ge0.15 oxynitridation in wet-nitric oxide ambient," MRS Symposium Series 765, 127-132 (2003).

Dasgupta A. and C.G. Takoudis, "Growth kinetics of thermal silicon oxynitridation in nitric oxide ambient," Journal of Applied Physics 93, 3615 (2003).

Dasgupta A. and C.G. Takoudis, "Two-step processes for bimodal N concentration profiles in ultra-thin silicon oxynitrides," Thin Solid Films 436, 162-167 (2003).

Roy Chowdhuri A., Dong-Un Jin, C. G. Takoudis, "Experimental and Theoretical Studied of the Si(100)/SiO2 Interface Formed by Wet and Dry Oxidation," MRS Symposium Series 747, 329-334 (2003).

Roy Chowdhuri A., C. G. Takoudis, R. F. Klie, N. D. Browning, "SiO2 Formation at the Aluminum Oxide/Si(100) Interface", MRS Symposium Series 747, 335-340 (2003).

Roy Chowdhuri A., C.G. Takoudis, R.F. Klie, and N.D. Browning, "Analysis of ultra-thin SiO2 interface layers in chemical vapor deposition of Al2O3 on Si by in-situ STEM," Applied Physics Letters 83, 1187-1189 (2003).

Dasgupta A., A. Roy Chowdhuri and C. G. Takoudis, "Metalorganic chemical vapor deposition of aluminum oxide on silicon nitride," MRS Symposium Series 751, 133-138 (2003).

Cui Z. and C.G. Takoudis, "Initial Oxidation of H-terminated Si((100) in O3(950 ppm)/O2 and Pure O2," J. Electrochem. Soc 150., G694-701 (2003).

Roy Chowdhuri A., D.-U. Jin, J. Rosado, C. G. Takoudis, "Strain and substoichiometry at the Si(100)/silicon dioxide interface," Phys. Rev. B 67., 245305/1-245305/7 (2003).

--- 2002 ---

Dasgupta A. and C.G. Takoudis, "Process - Structure Relationships of Nitrided Oxides and Oxynitrides," MRS Symposium Series 686, 255-260 (2002).

Loukeris C., S, Khan and C.G. Takoudis, "Apriori Process - Property Relationships of GaN Epitaxial Growth in Ga/N/H/C/O Systems," MRS Symposium Series 693, 99-104 (2002).

Dasgupta A., S.S. Dang, R.A. Matthes and C.G. Takoudis, "Web-Based Instruction on the Fundamentals and Design of Micro- and Nano-Electronic Processes: Innovations, Challenges, and Benefits," International Journal of Engineering Education 18, 539-549 (2002).

Roy Chowdhuri A., C.G. Takoudis, R.F. Klie, and N.D. Browning, "MOCVD of Aluminum Oxide on Si: Evidence of Interface SiO2 Formation," Appl. Phys. Lett. 80, 4241-4243 (2002).

Dasgupta A. and C.G. Takoudis, "Low Temperature Oxynitridation of SiGe in NO/N2O Ambients," MRS Symposium Series 715, 503-508 (2002).

Dasgupta A. C.G. Takoudis, and G. Martel, "On the Argon annealing-based improvements of the properties of ultra-thin oxynitrides nitrided with NH3," MRS Symposium Series 716, 177-182 (2002).